I operated high-vacuum systems to enable contamination-free deposition and thermal processing of refractory alloy thin films. Base pressures on the order of 10⁻⁸ Torr were maintained during deposition, while vacuum levels below 10⁻⁶–10⁻⁷ Torr were used during in-situ thermal dealloying to selectively remove sacrificial elements and preserve alloy integrity. 

I used high-vacuum environments to ensure reproducible deposition and annealing of multicomponent alloy thin films. Maintaining low oxygen partial pressure during deposition and post-deposition heat treatments enabled reliable assessment of intrinsic phase stability and mechanical behavior.